VINAY H. KESWANI, et al. Empirical Analysis of Electron Beam Lithography Optimization Models from a Pragmatic Perspective. International Journal on Recent and Innovation Trends in Computing and Communication, [S. l.], v. 11, n. 9, p. 1976–1985, 2023. DOI: 10.17762/ijritcc.v11i9.9195. Disponível em: https://ijritcc.org/index.php/ijritcc/article/view/9195. Acesso em: 31 oct. 2025.