, J. K. Layout and Analysis of different Current Mirror using 45nm Technology. International Journal on Recent and Innovation Trends in Computing and Communication, [S. l.], v. 5, n. 1, p. 239–243, 2017. DOI: 10.17762/ijritcc.v5i1.126. Disponível em: https://ijritcc.org/index.php/ijritcc/article/view/126. Acesso em: 27 jul. 2024.